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44979-G5
Studying Monolayer Formation on Alloys

Ellen Gawalt, Duquesne University

In this 2008 reporting period we have made progress on investigating the metal oxide-organic interaction on stainless steel 316L and its component oxides by working on the two goals of the proposal:  1. forming organic monolayers on the surface and varying the organic head group pKa from acidic to basic to determine if acidity of the head group is the controlling factor in reactivity; 2. studying the surface metal role in monolayer formation and stability by using the alloy and its individual components.

Goal 1: Prior to this reporting period we had successfully formed monolayers on the oxide surface of SS316L using octadecylcarboxylic acid and octadecylphosphonic acid and attempted to form monolayers using amines, alcohols and alkanes. In this reporting period we have attempted monolayer formation with hydroxamic (pKa = 8) and sulfonic acids (pKa = 2). All attempted surface modifications were analyzed by diffuse reflectance infrared spectroscopy. If modification was successful, the substrates were rinsed in the deposition solvent and sonicated to test the chemical and mechanical stability of the monolayer. Films stable to these tests were then analyzed by AFM and MALDI-TOF MS.

Octadecylhydroxamic acid formed ordered films upon deposition that were stable to rinsing (νCH2 asymm = 2916 cm-1). By AFM, it was concluded that the films were made up of micelles that were easily removed through sonication. The deposition of sulfonic acids has led to weakly bound multilayersCH2 asymm = 2913 cm-1; AFM indicates multilayer). The films were stable to rinsing but not sonciation in THF (Table 1).  The reactivity of the organics to SS316L substrate is, thus far, found to follow the order: phosphonic acid > carboxylic acid > hydroxamic acid = sulfonic acid> amine > alcohol > alkane. This is not consistent with increasing reactivity with increasing pKa due to the low stability of the sulfonic acid system. The sulfonic acid head group is larger than the other head groups which may hinder packing of the film and therefore stability of the film. Additionally, the deprotonated form of sulfonic acid, which is thought to be the reactive species in monolayer formation, is stabilized due to the delocalization of the charge by resonance, potentially rendering the acid less reactive. Additionally, both the phosphonic and carboxylic acids are bound to the surface in a bidentate manner, while the hydroxamic and sulfonic acids are in a monodentate orientation after rinsing.

Goal 2: The surface of SS316L is composed of oxides of the following metals: Fe 66.01%, Cr 19.19 %, Ni 9.17%, Mn 3.22% and Mo 2.42%. To determine the role of the surface components in monolayer formation we used each metal oxide as a substrate for monolayer formation. The results are summarized in Table 1. Monolayer formation with octadecylphosphonic acid was straightforward on all of the substrates, while carboxylic acid only formed monolayers on iron and molybdenum oxides and was only stable to rinse on iron.  Interestingly, these unreactive surface species do not prohibit formation of a complete monolayer of carboxylic acids on SS316L. The monolayers have been characterized by infrared spectroscopy, atomic force microscopy, and MALDI-TOF MS. The mass spectrometry data confirms the IR data presented here. Contact angle measurements are presented in Table 2.

ACIDS

Phosphonic acid

Carboxylic acid

Hydroxamic acid

Sulfonic acid

Metals

Rinse

Sonic

Rinse

Sonic

Rinse

Sonic

Rinse

Sonic

SS 316L

2912

2911

2915

2917

2916

-----

2913

----

Nickel

2914

2915

----

----

2916

-----

2918

----

Iron

2915

2916

2915

2915

----

-----

2916

-----

Chromium

2914

2914

-----

-----

-----

-----

2915

-----

Molybdenum

2914

2914

-----

-----

2913

2913

2914

-----

Manganese

2914

2914

----

-----

2914

-----

2914

----

Table 1. Value of the peak assigned to the asymmetric stretching of the methylene region (cm-1) which is correlated to film order (<2918 cm-1) and disorder (>2920 cm-1).  (Rinse = IR value after rinsing substrate in THF; Sonic = IR value after sonication in THF).

ACIDS

Phosphonic acid

Carboxylic acid

Hydroxamic acid

Sulfonic acid

Metals

θ °

+ Stdev

θ °

+ Stdev

θ °

+ Stdev

θ °

+ Stdev

SS 316L

108

3

104

1

76

9

90

4

Nickel

109

5

----

----

100

4

93

8

Iron

98

4

87

5

----

----

83

10

Chromium

99

8

----

----

----

----

17

6

Molybdenum

80

8

----

----

22

9

31

7

Manganese

58

7

----

----

68

13

101

6

Table 2. Static water contact angles on modified substrates with standard deviations.

In the extension reporting period, the group plans to explore fundamental surface reasons (such as isoelectric point, grain boundaries, etc) for the differences in reactivity between the alloy and its substituents and explore experimental changes to enhance the stability of sulfonic acid films on the surface. Additionally, chain length effects of the acids on monolayer formation and stability.

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