46972-SE
Chemical Vapor and Atomic Layer Deposition at the ACS National Meeting, August 2007, Boston, MA
This grant provided funds for three international scientists to speak at a symposium on Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) that was held in Boston, Massachusetts, at the August 2007 National Meeting of the American Chemical Society. The symposium included 21 invited lectures delivered by outstanding scientists in the field and several contributed poster presentations. The sponsoring organization was the ACS Division of Inorganic Chemistry. This CVD/ALD symposium was timely because these techniques are poised to become mainstays in the fabrication of the next generation of microelectronic devices. In addition, these techniques are important for the deposition of optical coatings and protective and hard coatings. The conference brought together synthetic chemists who prepare and study the reactivity and deposition of precursors, materials scientists and engineers who deposit thin films and investigate their properties, and industrial chemists and engineers who optimize these techniques for microelectronic and other applications. Both experimentalists and theoreticians were included as invited speakers in the symposium. Specifically, the ACS-PRF support was used to defray the travel expenses of three foreign speakers. Claire Carmalt is a faculty member at University College London and has published extensively on gallium compounds as potential CVD precursors and, more recently, on the use of CVD to deposit metal chalcogenide films. Films of metal chalcogenides are of interest for their tribological and catalytic properties. Markku Leskelä is a faculty member at the University of Helsinki where he has focused most of his effort on the atomic layer deposition of metal and metal oxide films that find applications as catalysts, optical coatings coatings and components in microelectronic devices. Roland Fischer is a faculty member at Ruhr University in Bochum, Germany whose work focuses on the developing new precursors for the chemical vapor deposition of metal nitrides and other important materials. In addition to the above international speakers, Yves Chabal (Rutgers), Jane Chang (UCLA), J. Randall Creighton (Sandia National Lab), William Desisto (Maine), Jeffrey Elam (Argonne National Lab), Steven George (Colorado), Wayne Gladfelter (Minnesota), Greg Girolami (Illinois), Roy Gordon (Harvard), Theodosia Gougousi (Maryland - Baltimore County), John Kouvetakis (Arizona State), Tobin Marks (Northwestern), Lisa McElwee-White (Florida), Charles Musgrave (Stanford), Deborah Neumayer (IBM), Gregory Parsons (North Carolina State), Charles Winter (Wayne State) and Zi-Ling Xue (Tennessee) presented talks during the two day symposium.
