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45778-SE
Self-Assembly Approaches to Nanopatterning, at the ACS National Meeting, September 2006, San Francisco, CA
The Symposium on Self-Assembly Approaches to Nanopatterning, one of the fourteen symposia in the Division of Polymeric Materials: Science and Engineering, was held during the 232nd American Chemical Society National Meeting and Exposition between September 10 and 14, 2006 in San Francisco, CA. It was organized by Professor Younan Xia of University of Washington (lead), Dr. Timothy J. Bunning of Air Force Research Laboratory, Professor L. Andrew Lyon of Georgia Institute of Technology, and Professor Hong Yang of University of Rochester.
This symposium is focused on the recently development on nontraditional approaches (e.g., bottom-up methods and soft lithography) to the fabrication of materials into well-defined structures. Patterning represents the first and one of the most significant challenges to the realization of a range structures types in fabricating flexible display, electronic devices, photonic components, sensors, microelectromechanical systems (MEMS), and lab-on-chip systems. In comparison to the conventional advanced nanolithographic techniques, such as deep UV photolithography and e-beam writing, bottom-up method can provide a more promising strategy for the formation of patterned structures in terms of cost, throughput, and potential for large-scale production. In this symposium, thirty-eight invited and contributing oral presentations were given on a wide range of topics on nontraditional methods for patterning at the nanoscale including self assembly of block co-polymers. Methods on using new nanoscale biological building blocks were covered in the context of creating two or three dimensional ordered structures through self-assembly. The symposium was organized into the following five sessions: Nanoscale Printing and Writing, Self-Assembly of Block Copolymers, Self-Assembly of Nanostructure, Assembly on Patterned Surface, and Bio-Enabled Nanopatterning.
This grant-in-aid was used to support the following three invited foreign speakers: Professor Kaori Kamata, Tokyo Institute of Technology, Japan; Dr. Matthias Geissler, IBM Zurich Research Laboratory in Rüschlikon, Switzerland; and Professor Lifeng Chi, Center for Nanotechnology (CeNTech), Westfälische Wilhelms-Universität, Germany. Prof. Kamata gave a talk on the design of a series of amphiphilic liquid crystal diblock copolymers and the microdomain alignment control with electrochemical ion diffusion through nanocylinders as well as the selective modification with magnetic and electric conducting metal oxides, metal ions, and electropolymerizable organic monomers. Dr. Geissler described the use of edge-spreading lithography in micro- and nanoscale patterning of alkanethiol monolayers on gold. Prof. Chi discussed the principles of self-organized surface patterning of Langmuir monolayers of phospholipid at air/water interface and its applications in generating nanostructures on solid substrates. The symposium was well attended with a typical audience size ranging from about fifty to over one hundred twenty people.
